(PRWEB) May 16, 2013
Dr. Stephen Y. Chou, Founder of Nanonex Corporation, will be giving a tutorial titled “Nanoimprint Lithography and Applications” at IEEE Nano 2013 in Beijing, China, on August 5th 2013.
Nanoimprint, invented in 1995 by Chou, is becoming one of the most critical nanofabrication technologies today due to a unique combination of sub-10 nm resolution, large area, and low cost unmatchable by other nanofabrication methods. Nanoimprint is impacting both R&D and manufacturing in a broad range of industries, from ICs, nano/micro optical devices (e.g. light-emitting diodes, cell phones, solar cells, displays), magnetic data storage, to biotechnology and medicine, just to name a few.
During his tutorial, Dr. Chou will talk about fundamentals of nanoimprint technologies, from nanoimprint methods, machines, masks, resists, to processes. He will also provide an overview of applications of nanoimprint in manufacturing in various fields mentioned above. The short course will cover the fundamentals as well as up-to-date approaches and applications.
The 13th IEEE International Conference on Nanotechnology will be held in Beijing, China, August 5th to 8th, 2013. The conference is sponsored by the Nanotechnology Council, which was officially formed in 2002 and has since then been the focus of nanotechnology activities in IEEE and more generally, a most important focus of the nanotechnology community worldwide.
Nanonex Corporation is the inventor of NIL, the world’s first nanoimprint lithography company, and the world’s leading provider of nanoimprint solutions that include equipment, masks, resists and processes. Nanonex’s patented and proprietary NIL solutions and Air-Cushion Press ™ can manufacture 3D nanostructures with sub-5 nm resolution, large-area uniformity, accurate overlay alignment, high throughput, and low cost. Nanonex NIL solutions have been adopted by a broad spectrum of appli
Copyright©2012 Vocus, Inc.
All rights reserved