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A deeper look at interfaces
Date:1/15/2014

"The interface is the device," Nobel laureate Herbert Kroemer famously observed, referring to the remarkable properties to be found at the junctures where layers of different materials meet. In today's burgeoning world of nanotechnology, the interfaces between layers of metal oxides are becoming increasingly prominent, with applications in such high-tech favorites as spintronics, high-temperature superconductors, ferroelectrics and multiferroics. Realizing the vast potential of these metal oxide interfaces, especially those buried in subsurface layers, will require detailed knowledge of their electronic structure. A new technique from an international team of researchers working at Berkeley Lab's Advanced Light Source (ALS) promises to deliver the goods.

In a study led by Charles Fadley, a physicist who holds joint appointments with Berkeley Lab's Materials Sciences Division and the University of California Davis, where he is a Distinguished Professor of Physics, the team combined two well-established techniques for studying electronic structure in crystalline materials into a new technique that is optimized for examining electronic properties at subsurface interfaces. They call this new technique SWARPES, for Standing Wave Angle-Resolved Photoemission Spectroscopy.

"SWARPES allows us for the first time to selectively study buried interfaces with either soft or hard x-rays," Fadley says. "The technique can be applied to any multilayer prototype device structure in spintronics, strongly correlated/high-TC superconductors, or semiconductor electronics. The only limitations are that the sample has to have a high degree of crystalline order, and has to be grown on a nanoscale multilayer mirror suitable for generating an x-ray standing wave."

As the name indicates, SWARPES combines the use of standing waves of x-rays with ARPES, the technique of choice for studying electronic structure. A standing wave is a vibrational pattern created whe
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Contact: Lynn Yarris
lcyarris@lbl.gov
510-486-5375
DOE/Lawrence Berkeley National Laboratory
Source:Eurekalert  

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